Caracterização e otimização dos processos de fotolitografia aplicados na fabricação de dispositivos micrometricos MOS e microssistemas / MOS devices and MEMS photolithographic fabrication processes characterization and optimization

AUTOR(ES)
DATA DE PUBLICAÇÃO

2004

RESUMO

The aim of this work is to improve the photolithographic processes of the CCS/Unicamp. This work attempts findout and optimize the most significant process parameters for the fabrication of micrometric structures. Contrast, adhesion, resolution, and minimum dimension for the shapes were studied in order to improve the process and also determine their limitations. A procedure for the processing of AZ 5214E photoresist was established so that periodic structures with dimension as low as 2 µm and isolated structures down to 0,8 µm can be produced reproductively

ASSUNTO(S)

microelectromechanical systems microeletronica fotolitografia mems microelectronics photolithography microssistemas eletromecanicos

ACESSO AO ARTIGO

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