Semiconductor characteristics of Nd doped PbO-Bi2O3-Ga2O3 films

AUTOR(ES)
FONTE

Brazilian Journal of Physics

DATA DE PUBLICAÇÃO

2006-06

RESUMO

In this work optical and semiconductor characteristics of gallium oxide based thin films are studied. This material has important electro-optic applications and offers possibilities for semiconductor applications in heavy metal oxide semiconductor technology. In this study thin films of PbO-Bi2O3-Ga2O3 were deposited by reactive sputtering. Two targets with different concentrations of Nd2O3 (0.2 and 1.0 wt%) were prepared. Thin films were deposited by pure Ar plasma, at 5 mTorr pressure and RF power of only 20 W. Films were deposited on three inch diameter substrates of (100) silicon wafers. Optical UV-Vis-Nir transmittance and FTIR analyses showed that the films are transparent in the visible and middle infrared region of the electromagnetic spectrum. The refractive index of the films was of about 2.3, as measured by ellipsometry; Rutherford Backscattering Spectroscopy (RBS) analyses were employed for the compositional analysis of the films. For the electrical characterization it was used metallic electrodes, and the final structure obtained is a capacitor structure where the gallium oxide film plays the role of a dielectric. In the current versus voltage (IxV) analyses, the samples with 1.0 wt% of Nd2O3 show semiconductor characteristics similar to the ones obtained for the degenerated transistors. The electric characteristics of these films allow applications with electro-optic devices (phototransistors and photo detectors).

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