Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples
AUTOR(ES)
Vasconcellos, Marcos Antonio Zen, Lima, Saulo Cordeiro, Hinrichs, Ruth
FONTE
Matéria (Rio de Janeiro)
DATA DE PUBLICAÇÃO
2010
RESUMO
Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
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