Construção e caracterização de um equipamento de corrosão ionica reativa e sua aplicação na corrosão de tungstenio e fotorresiste

AUTOR(ES)
DATA DE PUBLICAÇÃO

1993

RESUMO

This work has as objective the development of a Reactive Ion Etching (RIE) System, motivated by the need of this technique for the fabrication of devices and Integrated circuits with advanced technologies. The RIE equipment has been designed, constructed and characterized. An RF generator of up to 300W at a fixed frequency has been designed and built. This relatively low frequency was adapted because lt a) produces a higher etch rate of Tungsten and Photoresist, b) facilitates the installation by avoiding special precautions when dealing with high frenquency RF signals. c) facilitates the acquisition of the needed parts and devices resulting in a very cost effective solution. The vacuum system is composed of a mechanical pump In serles with an industrial air blower which operates in reverse. The system Is characterized ln terms of pumping speed and compared with commercial vacuum systems for plasma etching. The obtained pumping speed values are very reasonable, improvlng considerable the characteristics compared to a single mechanical pump ... Note: The complete abstract is available with the full electronic digital thesis or dissertations

ASSUNTO(S)

tungstenio - corrosão circuitos integrados engenharia do plasma

ACESSO AO ARTIGO

Documentos Relacionados