Avaliação da espessura e contaminantes da camada de oxido de titanio de diferentes marcas comerciais de implantes dentais osseointegraveis : analise por espectroscopia de fotoeletrons excitada por raios-X (XPS)
AUTOR(ES)
Alessandro Lourenço Januario
DATA DE PUBLICAÇÃO
2001
RESUMO
he aim of present study was to evaluate the presence of chemical elements as well as the thickness of titanium oxide layer from five dental implants.Eleven titanium implants (3.75 x 10 mm) were obtained from their respective suppliers and randomly distributed into five groups: group A: Nobel Biocare (n=2), group S: 31 (n=2), group C: Conexão (n=2), group D: AS Technology (n=2) and group E: Napio Implant System (n=3). The implants were analyzed by electron spectroscopy for chemical analysis (ESCA). The mean thickness of the titanium oxide layer for group E and A was 11.0 (+/-3,0) and 14.8 (+/-2,96) nm, respectively. The results for groups S, C and D were 6.3 (+/-0,49); 6.0 (+/-0,14) and 6.3 (+/-0,35)nm, respectively. The chemical analysis showed the presence of Ti and O in ali samples. Regarding the contamination of titanium oxide layer, the implants from group A revealed only carbon, while the implants from groups S, C, D and E showed the presence of inorganic contaminants as well. It can be concluded that: 1) implants from group A presented the smallest percentage of organic contaminants and no inorganic contaminants; 2) implants from group S presented the smallest inorganic contaminants percentage, but had the highest organic contaminants percentage and 3) the implants from group E presented the biggest variation of the inorganic contaminants
ASSUNTO(S)
espectroscopia de raio x quimica de superficie implantes dentarios endoosseos
ACESSO AO ARTIGO
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